著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Houlihan, Francis M. and Annual SPIE Cconference on Advances in Resist Ttechnology and Processing and Society of Photo-optical Instrumentation Engineers and Semiconductor Equipment and Materials International and International SEMATECH","Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA",,SPIE,2001,Proceedings,,0819440310,,https://cir.nii.ac.jp/crid/1130003902915151872