著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Mathad, G. S. and Cale, T. S. and Electrochemical Society. Dielectric Science and Technology Division and Electrochemical Society. Electronics Division","Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium",,Electrochemical Society,2003,Proceedings,,1566773938,,https://cir.nii.ac.jp/crid/1130282268976253824