著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Data Analysis and Modeling for Process Control (Conference) and Tobin, Kenneth W. and Society of Photo-optical Instrumentation Engineers and Semiconductor Equipment and Materials International and International SEMATECH","Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA",,SPIE,2004,Proceedings,,0819452912,,https://cir.nii.ac.jp/crid/1130282271333075200