著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hirofumi Matsuoka and Kaito Kanahashi and Naoki Tanaka and Yoshiaki Shoji and Lain-Jong Li and Jiang Pu and Hiroshi Ito and Hiromichi Ohta and Takanori Fukushima and Taishi Takenobu,Chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant,Japanese Journal of Applied Physics,0021-4922,IOP Publishing,2018-01-18,57,2S2,02CB15,https://cir.nii.ac.jp/crid/1360002221359587072,https://doi.org/10.7567/jjap.57.02cb15