Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Retsuo Kawakami and Takeshi Inaoka and Kikuo Tominaga and Takashi Mukai,Effects of Capacitively Coupled Radio Frequency Krypton and Argon Plasmas on Gallium Nitride Etching Damage,Japanese Journal of Applied Physics,0021-4922,IOP Publishing,2009-08-20,48,8,08HF01,https://cir.nii.ac.jp/crid/1360003446854928000,https://doi.org/10.1143/jjap.48.08hf01