著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Jun’ichi Shimizu and Takumi Ohashi and Kentaro Matsuura and Iriya Muneta and Kuniyuki Kakushima and Kazuo Tsutsui and Hitoshi Wakabayashi,High-mobility and low-carrier-density sputtered MoS<sub>2</sub>film formed by introducing residual sulfur during low-temperature in 3%-H<sub>2</sub>annealing for three-dimensional ICs,Japanese Journal of Applied Physics,0021-4922,IOP Publishing,2017-03-13,56,4S,04CP06,https://cir.nii.ac.jp/crid/1360003449891012864,https://doi.org/10.7567/jjap.56.04cp06