著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Ji-Myon Lee and Ki-Myung Chang and In-Hwan Lee and Seong-Ju Park,Highly selective dry etching of III nitrides using an inductively coupled Cl2/Ar/O2 plasma,"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",1071-1023,American Vacuum Society,2000-05-01,18,3,1409-1411,https://cir.nii.ac.jp/crid/1360011145626114176,https://doi.org/10.1116/1.591394