著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Michael Huff,Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication,Micromachines,2072-666X,MDPI AG,2021-08-20,12,8,991,https://cir.nii.ac.jp/crid/1360017286863992960,https://doi.org/10.3390/mi12080991