著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tomoyuki Kawashima and Masao Sakuraba and Bernd Tillack and Junichi Murota,Behavior of N atoms after thermal nitridation of Si1−xGex surface,Thin Solid Films,0040-6090,Elsevier BV,2012-02,520,8,3392-3396,https://cir.nii.ac.jp/crid/1360283691164232960,https://doi.org/10.1016/j.tsf.2011.10.108