著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Shuichi Kudo and Yukinori Hirose and Yoshifumi Ogawa and Tadashi Yamaguchi and Keiichiro Kashihara and Naofumi Murata and Toshiharu Katayama and Nobuyoshi Hattori and Toru Koyama and Koji Nakamae,Study of formation mechanism of nickel silicide discontinuities in high-performance complementary metal–oxide–semiconductor devices,Japanese Journal of Applied Physics,0021-4922,IOP Publishing,2014-01-10,53,2,021301,https://cir.nii.ac.jp/crid/1360284924865226112,https://doi.org/10.7567/jjap.53.021301