著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takashi Ubukata and Megumi Nakayama and Taishi Sonoda and Yasushi Yokoyama and Hideyuki Kihara,Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization,ACS Applied Materials & Interfaces,1944-8244,American Chemical Society (ACS),2016-08-17,8,34,21974-21978,https://cir.nii.ac.jp/crid/1360285708121798528,https://doi.org/10.1021/acsami.6b07943