Scalable Ultrahigh-Speed Fabrication of Uniform Polycrystalline Thin Films for Organic Transistors

  • Hao Wu
    Imaging Science and Engineering Research Center, Laboratory for Future Interdisciplinary Research of Science and Technology, Tokyo Institute of Technology, J1-2, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • Hiroaki Iino
    Imaging Science and Engineering Research Center, Laboratory for Future Interdisciplinary Research of Science and Technology, Tokyo Institute of Technology, J1-2, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • Jun-ichi Hanna
    Imaging Science and Engineering Research Center, Laboratory for Future Interdisciplinary Research of Science and Technology, Tokyo Institute of Technology, J1-2, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

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The fabrication of organic semiconductor thin films by printing technologies is expected to enable the low-cost production of devices such as flexible display drivers, RF-ID tags, and various chemical/biological sensors. However, large-scale high-speed fabrication of uniform semiconductor thin films with adequate electrical properties for these devices remains a big challenge. Herein, we demonstrate an ultrafast and scalable fabrication of uniform polycrystalline thin films with 100% surface coverage using liquid crystalline semiconductors such as 2-phenyl-7-decyl[1]benzothieno[3,2-

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