著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Romuald Blanc and François Leverd and Maxime Darnon and Gilles Cunge and Sylvain David and Olivier Joubert,Patterning of silicon nitride for CMOS gate spacer technology. III. Investigation of synchronously pulsed CH3F/O2/He plasmas,"Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena",2166-2746,American Vacuum Society,2014-03-01,32,2,,https://cir.nii.ac.jp/crid/1360292620142649984,https://doi.org/10.1116/1.4867357