著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI) H Nogami and Y Ogahara and K Mashimo and Y Nakagawa and T Tsukada,etching byM= 0 helicon plasma,Plasma Sources Science and Technology,0963-0252,IOP Publishing,1996-05-01,5,2,181-186,https://cir.nii.ac.jp/crid/1360299769473384960,https://doi.org/10.1088/0963-0252/5/2/010