著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kouichi Ono and Hiroaki Ohta and Koji Eriguchi,Plasma–surface interactions for advanced plasma etching processes in nanoscale ULSI device fabrication: A numerical and experimental study,Thin Solid Films,0040-6090,Elsevier BV,2010-04,518,13,3461-3468,https://cir.nii.ac.jp/crid/1360567182493857792,https://doi.org/10.1016/j.tsf.2009.11.030