著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kouichi Ono and Nobuya Nakazaki and Hirotaka Tsuda and Yoshinori Takao and Koji Eriguchi,"Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation",Journal of Physics D: Applied Physics,0022-3727,IOP Publishing,2017-09-15,50,41,414001,https://cir.nii.ac.jp/crid/1360567184378188672,https://doi.org/10.1088/1361-6463/aa8523