著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
G Cunge and M Kogelschatz and N Sadeghi,Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas,Plasma Sources Science and Technology,0963-0252,IOP Publishing,2004-08-01,13,3,522-530,https://cir.nii.ac.jp/crid/1360574094739876352,https://doi.org/10.1088/0963-0252/13/3/019