Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
N. Klein and N. Levanon,ac Electrical Breakdown in Thin Silicon Oxide Films,Journal of Applied Physics,0021-8979,AIP Publishing,1967-08-01,38,9,3721-3728,https://cir.nii.ac.jp/crid/1360576121478616064,https://doi.org/10.1063/1.1710201