著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nicholas J. Chittock and Martijn F. J. Vos and Tahsin Faraz and Wilhelmus M. M. (Erwin) Kessels and Harm C. M. Knoops and Adriaan J. M. Mackus,Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3,Applied Physics Letters,0003-6951,AIP Publishing,2020-10-19,117,16,,https://cir.nii.ac.jp/crid/1360580236964885632,https://doi.org/10.1063/5.0022531