著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Peter Ozaveshe Oviroh and Rokhsareh Akbarzadeh and Dongqing Pan and Rigardt Alfred Maarten Coetzee and Tien-Chien Jen,"New development of atomic layer deposition: processes, methods and applications",Science and Technology of Advanced Materials,1468-6996,Informa UK Limited,2019-05-23,20,1,465-496,https://cir.nii.ac.jp/crid/1360580240167721728,https://doi.org/10.1080/14686996.2019.1599694