著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tao Yin and Tosiro Doi and Syuhei Kurokawa and Zhao zhong Zhou and Kai ping Feng,Polishing Characteristics of MnO2 Polishing Slurry on the Si-face of SiC Wafer,International Journal of Precision Engineering and Manufacturing,2234-7593,Springer Science and Business Media LLC,2018-11-26,19,12,1773-1780,https://cir.nii.ac.jp/crid/1360580240182251392,https://doi.org/10.1007/s12541-018-0206-9