Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition

Details 詳細情報について

• CRID

  1360584340709692160

• DOI

  10.1016/j.mssp.2023.107613

• ISSN

  13698001

• Web Site

  https://api.elsevier.com/content/article/PII:S1369800123003062?httpAccept=text/xml

  https://api.elsevier.com/content/article/PII:S1369800123003062?httpAccept=text/plain

• Article Type

  journal article

• Data Source

  • Crossref
  • KAKEN