著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kunihiro Kamataki and Yusuke Sasaki and Iori Nagao and Daisuke Yamashita and Takamasa Okumura and Naoto Yamashita and Naho Itagaki and Kazunori Koga and Masaharu Shiratani,Low-temperature fabrication of silicon nitride thin films from a SiH4+N2 gas mixture by controlling SiNx nanoparticle growth in multi-hollow remote plasma chemical vapor deposition,Materials Science in Semiconductor Processing,1369-8001,Elsevier BV,2023-09,164,,107613,https://cir.nii.ac.jp/crid/1360584340709692160,https://doi.org/10.1016/j.mssp.2023.107613