著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hirotaka Tsuda and Nobuya Nakazaki and Yoshinori Takao and Koji Eriguchi and Kouichi Ono,Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments,"Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena",2166-2746,American Vacuum Society,2014-05-01,32,3,031212,https://cir.nii.ac.jp/crid/1360848660799878272,https://doi.org/10.1116/1.4874309