著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Norio Tokuda,Homoepitaxial Diamond Growth by Plasma-Enhanced Chemical Vapor Deposition,Topics in Applied Physics,0303-4216,Springer International Publishing,2019,,,1-29,https://cir.nii.ac.jp/crid/1360849940016815744,https://doi.org/10.1007/978-3-030-12469-4_1