著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
E. P. Donovan and F. Spaepen and D. Turnbull and J. M. Poate and D. C. Jacobson,Calorimetric studies of crystallization and relaxation of amorphous Si and Ge prepared by ion implantation,Journal of Applied Physics,0021-8979,AIP Publishing,1985-03-15,57,6,1795-1804,https://cir.nii.ac.jp/crid/1360855569792861184,https://doi.org/10.1063/1.334406