著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Xuefeng Hua and S. Engelmann and G. S. Oehrlein and P. Jiang and P. Lazzeri and E. Iacob and M. Anderle,Studies of plasma surface interactions during short time plasma etching of 193 and 248nm photoresist materials,"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",1071-1023,American Vacuum Society,2006-06-30,24,4,1850-1858,https://cir.nii.ac.jp/crid/1360855570186531968,https://doi.org/10.1116/1.2217973