著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
D. H. Kim and C. H. Lee and S. H. Cho and N.-E. Lee and G. C. Kwon,Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma,"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",1071-1023,American Vacuum Society,2005-09-01,23,5,2203-2211,https://cir.nii.ac.jp/crid/1360855570958036352,https://doi.org/10.1116/1.2009770