Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Shih-Nan Hsiao and Thi-Thuy-Nga Nguyen and Takayoshi Tsutsumi and Kenji Ishikawa and Makoto Sekine and Masaru Hori,On the Etching Mechanism of Highly Hydrogenated SiN Films by CF4/D2 Plasma: Comparison with CF4/H2,Coatings,2079-6412,MDPI AG,2021-12-14,11,12,1535,https://cir.nii.ac.jp/crid/1360857593797656576,https://doi.org/10.3390/coatings11121535