First room-temperature cw operation of a GaInAsP/InP light-emitting diode on a silicon substrate

  • M. Razeghi
    THOMSON–CSF/Laboratoire Central de Recherches, B. P. n°10, 91401 Orsay Cedex, France
  • M. Defour
    THOMSON–CSF/Laboratoire Central de Recherches, B. P. n°10, 91401 Orsay Cedex, France
  • F. Omnes
    THOMSON–CSF/Laboratoire Central de Recherches, B. P. n°10, 91401 Orsay Cedex, France
  • P. Maurel
    THOMSON–CSF/Laboratoire Central de Recherches, B. P. n°10, 91401 Orsay Cedex, France
  • R. Blondeau
    THOMSON–CSF/Laboratoire Central de Recherches, B. P. n°10, 91401 Orsay Cedex, France
  • F. Brillouet
    Centre National d’Etudes et des Télécommunications, 196, avenue H. Ranera, 92220 Bagneux, France

Bibliographic Information

Published
1988-09-05
DOI
  • 10.1063/1.100093
Publisher
AIP Publishing

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<jats:p>We report in this letter the first successful fabrication of an InP-GaInAsP light-emitting diode, emitting at 1.15 μm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 mA), and showed no degradation.</jats:p>

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