著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Gwenaelle Pound-Lana and Philippe Bézard and Camille Petit-Etienne and Sébastien Cavalaglio and Gilles Cunge and Benjamin Cabannes-Boué and Guillaume Fleury and Xavier Chevalier and Marc Zelsmann,Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers,ACS Applied Materials & Interfaces,1944-8244,American Chemical Society (ACS),2021-10-12,13,41,49184-49193,https://cir.nii.ac.jp/crid/1360861710913179520,https://doi.org/10.1021/acsami.1c13503