{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1361137043498745984.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1016/s0925-9635(02)00216-9"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S0925963502002169?httpAccept=text/xml"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S0925963502002169?httpAccept=text/plain"}}],"dc:title":[{"@value":"Measurement of C2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation"}],"description":[{"notation":[{"@value":"Abstract   C 2  radical density in a conventional microwave plasma-enhanced chemical vapor deposition (MWPCVD) with CH 4 /H 2  mixture was measured using absorption spectroscopy. At the typical growth conditions for MWPCVD used for nanocrystalline diamond formation, C 2  radical density in the plasma was of the order of 10 12  cm −3 . Correlation between nanocrystalline diamond growth and C 2  radical density was discussed."}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1380288171350036354","@type":"Researcher","foaf:name":[{"@value":"M. Hiramatsu"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137043498745987","@type":"Researcher","foaf:name":[{"@value":"K. Kato"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137043498745984","@type":"Researcher","foaf:name":[{"@value":"C.H. Lau"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137043498745988","@type":"Researcher","foaf:name":[{"@value":"J.S. Foord"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137043498745986","@type":"Researcher","foaf:name":[{"@value":"M. Hori"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"09259635"},{"@type":"PISSN","@value":"http://id.crossref.org/issn/09259635"}],"prism:publicationName":[{"@value":"Diamond and Related Materials"}],"dc:publisher":[{"@value":"Elsevier BV"}],"prism:publicationDate":"2003-03","prism:volume":"12","prism:number":"3-7","prism:startingPage":"365","prism:endingPage":"368"},"reviewed":"false","dcterms:accessRights":"http://purl.org/coar/access_right/c_abf2","dc:rights":["https://www.elsevier.com/tdm/userlicense/1.0/"],"url":[{"@id":"https://api.elsevier.com/content/article/PII:S0925963502002169?httpAccept=text/xml"},{"@id":"https://api.elsevier.com/content/article/PII:S0925963502002169?httpAccept=text/plain"}],"createdAt":"2003-05-12","modifiedAt":"2019-03-31","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1050588667320782848","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Insight into temperature impact of Ta filaments on high-growth-rate diamond (100) films by hot-filament chemical vapor deposition"}]},{"@id":"https://cir.nii.ac.jp/crid/1360847874816358400","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Fabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001204249402624","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Effect of CH/C<SUB>2</SUB> Species Density on Surface Morphology of Diamond Film Grown by Microwave Plasma Jet Chemical Vapor Deposition"},{"@value":"Effect of CH/C2 species density on surface morphology of diamond film grown by microwave plasma jet chemical vapor deposition"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205417886336","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD"},{"@language":"ja","@value":"メタン／水素マイクロ波プラズマＣＶＤ法による純チタン基板上のナノダイヤモンド成膜"},{"@language":"ja-Kana","@value":"メタン スイソ マイクロハ プラズマ CVDホウ ニ ヨル ジュンチタン キバン ジョウ ノ ナノダイヤモンドセイマク"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001206264168832","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition"},{"@value":"Fabrication of Dense Carbon Nanotube Films Using Microwave Plasm-Enhanced Chemical Vapor Deposition"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282681240814848","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition"}]},{"@id":"https://cir.nii.ac.jp/crid/1520572357920067200","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Fabrication of Carbon Nanowalls Using Novel Plasma Processing"},{"@language":"ja-Kana","@value":"Fabrication of Carbon Nanowalls Using Novel Plasma Processing"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1016/s0925-9635(02)00216-9"},{"@type":"OPENAIRE","@value":"doi_dedup___::1e8359d4ab57f9bc2a5c1f9272cf57ad"},{"@type":"CROSSREF","@value":"10.1016/j.diamond.2021.108515_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"},{"@type":"CROSSREF","@value":"10.2472/jsms.54.73_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"},{"@type":"CROSSREF","@value":"10.2320/matertrans.mra2007324_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"},{"@type":"CROSSREF","@value":"10.7567/jjap.52.01ak04_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"},{"@type":"CROSSREF","@value":"10.1143/jjap.44.l693_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"},{"@type":"CROSSREF","@value":"10.1143/jjap.44.1150_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"},{"@type":"CROSSREF","@value":"10.1143/jjap.45.5522_references_DOI_3Ydqc4X1kQs109PqZJnyBHvwX7K"}]}