{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1361137045588065024.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1002/app.1991.070420213"}},{"identifier":{"@type":"URI","@value":"https://api.wiley.com/onlinelibrary/tdm/v1/articles/10.1002%2Fapp.1991.070420213"}},{"identifier":{"@type":"URI","@value":"https://onlinelibrary.wiley.com/doi/pdf/10.1002/app.1991.070420213"}}],"dc:title":[{"@value":"Mechanistic study on photocuring of a methacrylates copolymer by benzophenones"}],"description":[{"type":"abstract","notation":[{"@value":"<jats:title>Abstract</jats:title><jats:p>The types of photochemical reactions that will occur in the photosensitive resin for optical devices, poly(methyl methacrylate‐<jats:italic>co</jats:italic>‐crotyl methacrylate) (PMMA–CMA) doped with <jats:italic>meta</jats:italic>‐benzoylbenzophenone (BBP), were investigated. Oxetane formation, hydrogen abstraction followed by radical coupling, and pinacol formation were found to occur. The quantum yield for disappearance of benzophenone (BP) in the PMMA–CMA film was estimated as 0.68. The pendant crotyl group seems to be a major photoreaction site.</jats:p>"}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1381137045588065024","@type":"Researcher","foaf:name":[{"@value":"Yoshikatsu Ito"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137045588065026","@type":"Researcher","foaf:name":[{"@value":"Yasushi Aoki"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137045588064896","@type":"Researcher","foaf:name":[{"@value":"Teruo Matsuura"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137045588064897","@type":"Researcher","foaf:name":[{"@value":"Nobuhiro Kawatsuki"}]},{"@id":"https://cir.nii.ac.jp/crid/1381137045588065025","@type":"Researcher","foaf:name":[{"@value":"Masao Uetsuki"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00218995"},{"@type":"EISSN","@value":"10974628"}],"prism:publicationName":[{"@value":"Journal of Applied Polymer Science"}],"dc:publisher":[{"@value":"Wiley"}],"prism:publicationDate":"1991-01-20","prism:volume":"42","prism:number":"2","prism:startingPage":"409","prism:endingPage":"415"},"reviewed":"false","dc:rights":["http://onlinelibrary.wiley.com/termsAndConditions#vor"],"url":[{"@id":"https://api.wiley.com/onlinelibrary/tdm/v1/articles/10.1002%2Fapp.1991.070420213"},{"@id":"https://onlinelibrary.wiley.com/doi/pdf/10.1002/app.1991.070420213"}],"createdAt":"2003-04-15","modifiedAt":"2023-11-21","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1050585426676302976","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Concept model of atomic hydrogen dry developing process for photolithographic patterning"}]},{"@id":"https://cir.nii.ac.jp/crid/1520572359297475584","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Surface relief formation in photo-cross-linkable polymer/benzophenone composite films using 325nm laser"},{"@language":"ja-Kana","@value":"Surface relief formation in photo cross linkable polymer benzophenone composite films using 325nm laser"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1002/app.1991.070420213"},{"@type":"OPENAIRE","@value":"doi_dedup___::688659e57176c056b92fa76a055163a9"},{"@type":"CROSSREF","@value":"10.1143/jjap.49.080207_references_DOI_Jwx6pqbXtvzR5kiqVf48z4XqD8b"},{"@type":"CROSSREF","@value":"10.1063/5.0027509_references_DOI_Jwx6pqbXtvzR5kiqVf48z4XqD8b"}]}