著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
S. E. Alexandrov and N. McSporran and M. L. Hitchman,Remote AP‐PECVD of Silicon Dioxide Films from Hexamethyldisiloxane (HMDSO),Chemical Vapor Deposition,0948-1907,Wiley,2005-12,11,11-12,481-490,https://cir.nii.ac.jp/crid/1361137046201034368,https://doi.org/10.1002/cvde.200506385