著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Dustin Nest and Ting‐Ying Chung and David B. Graves and Sebastian Engelmann and Robert L. Bruce and Florian Weilnboeck and Gottlieb S. Oehrlein and Deyan Wang and Cecily Andes and Eric A. Hudson,Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment,Plasma Processes and Polymers,1612-8850,Wiley,2009-10-13,6,10,649-657,https://cir.nii.ac.jp/crid/1361418518554660480,https://doi.org/10.1002/ppap.200900039