著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Christian Wagner and Jose Bacelar and Noreen Harned and Erik Loopstra and Stef Hendriks and Ivo de Jong and Peter Kuerz and Leon Levasier and Mark van de Kerkhof and Martin Lowisch and Hans Meiling and David Ockwell and Rudy Peeters and Eelco van Setten and Judon Stoeldraijer and Stuart Young and John Zimmerman and Ron Kool,EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100,SPIE Proceedings,0277-786X,SPIE,2011-03-17,7969,,79691F,https://cir.nii.ac.jp/crid/1361418518678825344,https://doi.org/10.1117/12.878603