著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Keren J. Kanarik and Samantha Tan and Wenbing Yang and Taeseung Kim and Thorsten Lill and Alexander Kabansky and Eric A. Hudson and Tomihito Ohba and Kazuo Nojiri and Jengyi Yu and Rich Wise and Ivan L. Berry and Yang Pan and Jeffrey Marks and Richard A. Gottscho,Predicting synergy in atomic layer etching,"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films",0734-2101,American Vacuum Society,2017-03-27,35,5,05C302,https://cir.nii.ac.jp/crid/1361418519970424960,https://doi.org/10.1116/1.4979019