著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Vahagn Martirosyan and Emilie Despiau-Pujo and Jerome Dubois and Gilles Cunge and Olivier Joubert,Helium plasma modification of Si and Si3N4 thin films for advanced etch processes,"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films",0734-2101,American Vacuum Society,2018-06-01,36,4,,https://cir.nii.ac.jp/crid/1361418520129874688,https://doi.org/10.1116/1.5025152