著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
R. Chanson and L. Zhang and S. Naumov and Yu. A. Mankelevich and T. Tillocher and P. Lefaucheux and R. Dussart and S. De Gendt and J.-F. de Marneffe,Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above −50 °C,Scientific Reports,2045-2322,Springer Science and Business Media LLC,2018-01-30,8,1,,https://cir.nii.ac.jp/crid/1361418520457889920,https://doi.org/10.1038/s41598-018-20099-5