著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
H. Toyoda and H. Morishima and R. Fukute and Y. Hori and I. Murakami and H. Sugai,Beam study of the Si and SiO2 etching processes by energetic fluorocarbon ions,Journal of Applied Physics,0021-8979,AIP Publishing,2004-05-01,95,9,5172-5179,https://cir.nii.ac.jp/crid/1361418521504938368,https://doi.org/10.1063/1.1690094