{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1361699993950310656.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1063/1.354133"}},{"identifier":{"@type":"URI","@value":"https://pubs.aip.org/aip/jap/article-pdf/74/1/15/18659321/15_1_online.pdf"}}],"dc:title":[{"@value":"Optically pumped laser action in double-heterostructure HgCdTe grown by metalorganic chemical vapor deposition on a CdTe substrate"}],"description":[{"type":"abstract","notation":[{"@value":"<jats:p>Photopumped laser action in a HgCdTe double-heterostructure grown by metalorganic chemical vapor deposition on a CdTe substrate containing (311)- and (211)-oriented grains was studied. The (311)-oriented device exhibited laser action around λ=4 μm with a threshold power increasing exponentially from 56 mW at T=12 K to 2.8 W at the highest lasing temperature of 90 K. The (211)-oriented laser device emitted around 2.5 μm. The threshold power of the (211) device was much higher than that of the (311) one (1.5 W at 12 K) and increased with temperature at a lower rate to 4.8 W at the highest lasing temperature of 110 K. Front illumination photoluminescence from both active and cladding layers of the (311)-oriented heterostructure was studied as a function of temperature.</jats:p>"}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1381699993950310785","@type":"Researcher","foaf:name":[{"@value":"A. Ravid"}],"jpcoar:affiliationName":[{"@value":"Solid State Physics Department, Soreq Nuclear Research Centre, Yavne 70600, Israel"}]},{"@id":"https://cir.nii.ac.jp/crid/1381699993950310786","@type":"Researcher","foaf:name":[{"@value":"G. Cinader"}],"jpcoar:affiliationName":[{"@value":"Solid State Physics Department, Soreq Nuclear Research Centre, Yavne 70600, Israel"}]},{"@id":"https://cir.nii.ac.jp/crid/1381699993950310784","@type":"Researcher","foaf:name":[{"@value":"A. Zussman"}],"jpcoar:affiliationName":[{"@value":"Solid State Physics Department, Soreq Nuclear Research Centre, Yavne 70600, Israel"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00218979"},{"@type":"EISSN","@value":"10897550"}],"prism:publicationName":[{"@value":"Journal of Applied Physics"}],"dc:publisher":[{"@value":"AIP Publishing"}],"prism:publicationDate":"1993-07-01","prism:volume":"74","prism:number":"1","prism:startingPage":"15","prism:endingPage":"19"},"reviewed":"false","url":[{"@id":"https://pubs.aip.org/aip/jap/article-pdf/74/1/15/18659321/15_1_online.pdf"}],"createdAt":"2002-07-26","modifiedAt":"2024-02-02","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1390001206252709120","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Dielectric Properties and X-Ray Study of Zr-Sbustituted Pb(Yb1/2Nb1/2)O3 Ceramics."},{"@value":"Dielectric Properties and X-Ray Study of Zr-Sbustituted Pb(Yb<sub>1/2</sub>Nb<sub>1/2</sub>)O<sub>3</sub> Ceramics"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282680068632320","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Structure and Magnetic Characteristics of Fe Films with Ar Bombardment during and after Deposition"},{"@language":"ja","@value":"膜堆積中と後にＡｒイオン衝撃を加えたＦｅ薄膜の構造と磁気特性"},{"@language":"ja-Kana","@value":"マク タイセキ チュウ ト アト ニ Ar イオン ショウゲキ オ クワエタ Fe ハクマク ノ コウゾウ ト ジキ トクセイ"},{"@value":"膜堆積中と後にArイオン衝撃を加えたFe薄膜の構造と磁気特性(薄膜)"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282681244774400","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"An Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching"},{"@language":"ja-Kana","@value":"Atomic Scale Model of Multilayer Surface Reactions and the Feature Profile Evolution during Plasma Etching"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1063/1.354133"},{"@type":"CROSSREF","@value":"10.1143/jjap.38.5474_references_DOI_85a54ZPzfi3wLb8hVqu2EXKqNbn"},{"@type":"CROSSREF","@value":"10.3379/jmsjmag.28.380_references_DOI_85a54ZPzfi3wLb8hVqu2EXKqNbn"},{"@type":"CROSSREF","@value":"10.1143/jjap.44.8650_references_DOI_85a54ZPzfi3wLb8hVqu2EXKqNbn"}]}