著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
N. B. Kenchappa and Ramtej Popuri and Ashwin Chockkalingam and Puneet Jawali and Shiyan Jayanath and Daniel Redfield and Rajeev Bajaj,Soft Chemical Mechanical Polishing Pad for Oxide CMP Applications,ECS Journal of Solid State Science and Technology,2162-8769,The Electrochemical Society,2021-01-01,10,1,014008,https://cir.nii.ac.jp/crid/1361699994056765952,https://doi.org/10.1149/2162-8777/abdc40