著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hyun-Ho Doh and Jung-Hun Kim and Seok-Hyun Lee and Ki-Woong Whang,"Mechanism of selective SiO2/Si etching with fluorocarbon gases (CF4, C4F8) and hydrogen mixture in electron cyclotron resonance plasma etching system","Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films",0734-2101,American Vacuum Society,1996-09-01,14,5,2827-2834,https://cir.nii.ac.jp/crid/1361699994914358784,https://doi.org/10.1116/1.580231