著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
F. Laermer and A. Urban,"Challenges, developments and applications of silicon deep reactive ion etching",Microelectronic Engineering,0167-9317,Elsevier BV,2003-06,67-68,,349-355,https://cir.nii.ac.jp/crid/1361699995011729664,https://doi.org/10.1016/s0167-9317(03)00089-3