著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
M. I. B. Bernardi and E. J. H. Lee and P. N. Lisboa-Filho and E. R. Leite and E. Longo and A. G. Souza,Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method,Cerâmica,0366-6913,FapUNIFESP (SciELO),2002-12,48,308,192-198,https://cir.nii.ac.jp/crid/1361699995269578752,https://doi.org/10.1590/s0366-69132002000400005