著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Jun'ichi Shimizu and Takumi Ohashi and Kentaro Matsuura and Iriya Muneta and Kuniyuki Kakushima and Kazuo Tsutsui and Nobuyuki Ikarashi and Hitoshi Wakabayashi,Low-carrier density sputtered-MoS<inf>2</inf> film by H<inf>2</inf>S annealing for normally-off accumulation-mode FET,2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM),,IEEE,2017-02,,,222-223,https://cir.nii.ac.jp/crid/1361981468673400448,https://doi.org/10.1109/edtm.2017.7947572