著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
B. Hoex and S. B. S. Heil and E. Langereis and M. C. M. van de Sanden and W. M. M. Kessels,Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3,Applied Physics Letters,0003-6951,AIP Publishing,2006-07-24,89,4,042112,https://cir.nii.ac.jp/crid/1361981470108769920,https://doi.org/10.1063/1.2240736