著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Demetre J Economou,Pulsed plasma etching for semiconductor manufacturing,Journal of Physics D: Applied Physics,0022-3727,IOP Publishing,2014-07-01,47,30,303001,https://cir.nii.ac.jp/crid/1362262944407327104,https://doi.org/10.1088/0022-3727/47/30/303001