著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yoshio Susa and Hiroto Ohtake and Zhao Jianping and Lee Chen and Toshihisa Nozawa,Characterization of CO2 plasma ashing for less low-dielectric-constant film damage,"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films",0734-2101,American Vacuum Society,2015-09-24,33,6,,https://cir.nii.ac.jp/crid/1362262944550889472,https://doi.org/10.1116/1.4931785