著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
H. K. Moffat and K. F. Jensen,Three‐Dimensional Flow Effects in Silicon CVD in Horizontal Reactors,Journal of The Electrochemical Society,0013-4651,The Electrochemical Society,1988-02-01,135,2,459-471,https://cir.nii.ac.jp/crid/1362262944597298944,https://doi.org/10.1149/1.2095638